Modeling the field diffracted from photo mask at oblique incidence
Elazhary, T.T.; Morshed, A.H.; Khalil, Diaa;
Other data
Title | Modeling the field diffracted from photo mask at oblique incidence | Authors | Elazhary, T.T.; Morshed, A.H.; Khalil, Diaa | Issue Date | 2010 | Journal | Applied Optics | DOI | 10.1364/AO.49.004207 | Scopus ID | 2-s2.0-77955907539 |
Recommend this item
Similar Items from Core Recommender Database
Items in Ain Shams Scholar are protected by copyright, with all rights reserved, unless otherwise indicated.